JPH0418428U - - Google Patents
Info
- Publication number
- JPH0418428U JPH0418428U JP5834990U JP5834990U JPH0418428U JP H0418428 U JPH0418428 U JP H0418428U JP 5834990 U JP5834990 U JP 5834990U JP 5834990 U JP5834990 U JP 5834990U JP H0418428 U JPH0418428 U JP H0418428U
- Authority
- JP
- Japan
- Prior art keywords
- gas introduction
- wafer
- introduction nozzle
- cvd apparatus
- susceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 8
- 238000001816 cooling Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 description 2
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5834990U JPH0418428U (en]) | 1990-06-01 | 1990-06-01 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5834990U JPH0418428U (en]) | 1990-06-01 | 1990-06-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0418428U true JPH0418428U (en]) | 1992-02-17 |
Family
ID=31583880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5834990U Pending JPH0418428U (en]) | 1990-06-01 | 1990-06-01 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0418428U (en]) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0936050A (ja) * | 1995-07-25 | 1997-02-07 | Mitsubishi Electric Corp | 常圧cvd装置 |
-
1990
- 1990-06-01 JP JP5834990U patent/JPH0418428U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0936050A (ja) * | 1995-07-25 | 1997-02-07 | Mitsubishi Electric Corp | 常圧cvd装置 |
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